Surface sensitivity in scanning transmission x-ray microspectroscopy using secondary electron detection

被引：25

作者：

Hub, C. ^{[1
]}

Wenzel, S. ^{[1
]}

Raabe, J. ^{[2
]}

Ade, H. ^{[3
]}

Fink, R. H. ^{[1
]}

机构：

[1] Univ Erlangen Nurnberg, ICMM, D-91058 Erlangen, Germany

[2] Paul Scherrer Inst, Swiss Light Source, CH-5232 Villigen, Switzerland

[3] N Carolina State Univ, Dept Phys, Raleigh, NC 27695 USA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2010年 / 81卷 / 03期

关键词：

electron multipliers; X-ray microscopy; X-ray spectroscopy; PLATE GENERATED MICROPROBE; ADVANCED LIGHT-SOURCE; IN-SITU ANALYSIS; COMET; 81P/WILD-2; POLY(METHYL METHACRYLATE); MICROSCOPY; SPECTROMICROSCOPY; SPECTROSCOPY; BEAMLINE; BLENDS;

D O I：

10.1063/1.3360813

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The successful integration of electron detection into an existing scanning transmission x-ray microspectroscope (STXM) at the Swiss Light Source is demonstrated. In conventional x-ray detection using a photomultiplier, STXM offers mainly bulk sensitivity combined with high lateral resolution. However, by implementation of a channeltron electron multiplier, the surface sensitivity can be established by the detection of secondary electrons emitted from the sample upon resonant excitation. We describe the experimental setup and discuss several relevant aspects, in particular the schemes to correct for self-absorption in the specimen due to back illumination in case of thicker films.

引用

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