Growth of LaNiO3 thin films on MgO by flash MOCVD

被引:17
作者
Gorbenko, OY [1 ]
Bosak, AA [1 ]
机构
[1] Moscow MV Lomonosov State Univ, Dept Chem, Moscow 119899, Russia
关键词
MOCVD; XRD characterization; Lanthanum nickelate; In-plane alignment;
D O I
10.1016/S0022-0248(97)00454-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
LaNiO3 thin films on MgO were grown by flash MOCVD on single crystalline (0 0 1)MgO substrates using La(thd)(3), Ni(acim)(2) or Ni(thd)(2) (acim and thd are anions of acetylacetonimine and dipivaloylmethane, respectively) as volatile precursors. X-ray diffraction study of the films with different thicknesses was used to clarify the growth peculiarities. Two stages of growth were observed. At the beginning (0 0 1) oriented LaNiO3 layer (pseudocubic indices) grows with uniform in-plane alignment. Next, another orientation, namely (1 1 0), aligned in-plane with (0 0 1) layer appears as auxiliary one. In-plane matching variants are discussed. Consistent explanation of the preferable in-plane orientations observed was achieved with a nearly coincident sites lattices (NCSL) analysis. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:181 / 188
页数:8
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