Structure of anodic films formed on magnesium

被引：67

作者：

Ono, S

Asami, K

Osaka, T

Masuko, N

机构：

[1] TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 98077,JAPAN

[2] WASEDA UNIV,KAGAMI MEM LAB MAT SCI & TECHNOL,SCH SCI & ENGN,DEPT APPL CHEM,SHINJUKU KU,TOKYO 169,JAPAN

[3] CHIBA INST TECHNOL,DEPT MET,NARASHINO,CHIBA 275,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1996年 / 143卷 / 03期

关键词：

D O I：

10.1149/1.1836533

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The cylindrical pore structure and barrier layer of anodic films formed on magnesium which are similar to the Keller's model of anodic alumina are determined by direct cross-sectional observation. The ratios of cell diameter and barrier layer thickness to the forming voltage are notably smaller than those associated with anodic alumina. It is assumed that anodic film growth proceeds mainly by the formation of MgF2 and Mgx+y/2Ox(OH)(y) (magnesium oxyhydroxide) at the metal/film interface and the dissolution of the film at pore bases.

引用

页码：L62 / L63

页数：2

共 13 条

[1] XPS DETERMINATION OF COMPOSITIONS OF ALLOY SURFACES AND SURFACE OXIDES ON MECHANICALLY POLISHED IRON-CHROMIUM ALLOYS [J].