Surface-treatment effects on organic thin-film transistors

被引:190
作者
Lim, SC
Kim, SH [1 ]
Lee, JH
Kim, MK
Kim, DJ
Zyung, T
机构
[1] Elect & Telecommun Res Inst, Taejon 305350, South Korea
[2] Chungnam Natl Univ, Dept Mat Sci & Engn, Taejon 305764, South Korea
[3] Kyung Hee Univ, Informat Display Dept, Seoul 130701, South Korea
关键词
organic thin-film transistors; O-2-plasma treatment; HMDS treatment; OTS treatment; semiconductors;
D O I
10.1016/j.synthmet.2004.08.034
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have fabricated organic thin-film transistors (OTFTs) using pentacene as an active layer with chemically modified SiO2 gate dielectrics. The effects of the surface treatment of SiO2 on the electric characteristics of OTFTs were investigated. The SiO2 gate dielectric surfaces were treated by normal wet-cleaning process, O-2-plasma treatment, hexamethyldisilazane (HMDS), and octadecyltrichlorosilane (OTS) treatment. After the surface treatments, the contact angle and surface free energy were measured in order to analyze the surface state changes. From the electrical measurements, typical I-V characteristics of TFTs were observed. The field effect mobility, mu, was calculated to be 0.29 cm(2) V-1 s(-1) for OTS-treated sample, while those of the HMDS, O-2-plasma treated, and wet-cleaned samples to be 0.16, 0.1, and 0.04 cm(2) V-1 s(-1), respectively. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:75 / 79
页数:5
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