Absolute measurement of transient carrier concentration and temperature gradients in power semiconductor devices by internal IR-laser deflection

被引:28
作者
Deboy, G
Solkner, G
Wolfgang, E
Claeys, W
机构
[1] Siemens AG, Corporate Research and Development, D-81739 München
[2] Université de Bordeaux I, CPMOH, F-33405 Talence, 351, Cours de la Libération
关键词
D O I
10.1016/0167-9317(95)00352-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
[No abstract available]
引用
收藏
页码:299 / 307
页数:9
相关论文
共 9 条
[1]   TEMPERATURE-DEPENDENCE OF THE REFRACTIVE-INDEX IN SEMICONDUCTORS [J].
BERTOLOTTI, M ;
BOGDANOV, V ;
FERRARI, A ;
JASCOW, A ;
NAZOROVA, N ;
PIKHTIN, A ;
SCHIRONE, L .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1990, 7 (06) :918-922
[2]   LASER PROBING OF THERMAL-BEHAVIOR OF ELECTRONIC COMPONENTS AND ITS APPLICATION IN QUALITY AND RELIABILITY TESTING [J].
CLAEYS, W ;
DILHAIRE, S ;
QUINTARD, V .
MICROELECTRONIC ENGINEERING, 1994, 24 (1-4) :411-420
[3]  
DEBOY G, 1994, P VOL 5 EUR S REL EL, P189
[4]   SEEBECK EFFECT IN SILICON [J].
GEBALLE, TH ;
HULL, GW .
PHYSICAL REVIEW, 1955, 98 (04) :940-947
[5]   THE OPTICAL (FREE-CARRIER) ABSORPTION OF A HOLE-ELECTRON PLASMA IN SILICON [J].
HORWITZ, CM ;
SWANSON, RM .
SOLID-STATE ELECTRONICS, 1980, 23 (12) :1191-1194
[6]   QUANTUM CALCULATIONS OF THE CHANGE OF REFRACTIVE-INDEX DUE TO FREE-CARRIERS IN SILICON WITH NONPARABOLIC BAND-STRUCTURE [J].
HUANG, HC ;
YEE, S ;
SOMA, M .
JOURNAL OF APPLIED PHYSICS, 1990, 67 (04) :2033-2039
[7]   THE TEMPERATURE-DEPENDENCE OF THE REFRACTIVE-INDEX OF SILICON AT ELEVATED-TEMPERATURES AT SEVERAL LASER WAVELENGTHS [J].
JELLISON, GE ;
BURKE, HH .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (02) :841-843
[8]  
Magunov A. N., 1992, Optics and Spectroscopy, V73, P205
[9]   ELECTROOPTICAL EFFECTS IN SILICON [J].
SOREF, RA ;
BENNETT, BR .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1987, 23 (01) :123-129