Generation of thin surface plasma layers for atmospheric-pressure surface treatments

被引:48
作者
Cernák, M
Ráhel, J
Kovácik, D
Simor, M
Brablec, A
Slavícek, P
机构
[1] Comenius Univ, Fac Mat Phys & Informat, Inst Phys, Bratislava 84248, Slovakia
[2] Masaryk Univ, Dept Phys Elect, CS-61137 Brno, Czech Republic
关键词
plasma-surface; interactions; surface treatment;
D O I
10.1002/ctpp.200410069
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 [等离子体物理]; 080103 [流体力学]; 080704 [流体机械及工程];
摘要
Thin layers of atmospheric-pressure non-equilibrium plasma can be generated by pulse surface corona discharges and surface barrier discharges developing on the treated surfaces or brought into a close contact with the treated surfaces. Plasma sources based on these discharge types have the potential of meeting the basic on-line production requirements in the industry and can be useful for a wide range of surface treatments and deposition processes including continuous treatment of textiles. Comparing with atmospheric pressure glow discharge sources, the potential advantages of these plasma sources include their simplicity, robustness, and capability to process in a wide range of working gases.
引用
收藏
页码:492 / 495
页数:4
相关论文
共 33 条
[1]
Novel AC and DC non-thermal plasma sources for cold surface treatment of polymer films and fabrics at atmospheric pressure [J].
Akishev, Y ;
Grushin, M ;
Napartovich, A ;
Trushkin, N .
PLASMAS AND POLYMERS, 2002, 7 (03) :261-289
[2]
Brablec A, 2002, CZECH J PHYS, V52, P561
[3]
CERNAK M, 2000, PLASMA POLYM, V5, P119
[4]
The development of dielectric barrier discharges in gas gaps and on surfaces [J].
Gibalov, VI ;
Pietsch, GJ .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2000, 33 (20) :2618-2636
[5]
Biaxially oriented polypropylene (BOPP) surface modification by nitrogen atmospheric pressure glow discharge (APGD) and by air corona [J].
Guimond, S ;
Radu, I ;
Czeremuszkin, G ;
Carlsson, DJ ;
Wertheimer, MR .
PLASMAS AND POLYMERS, 2002, 7 (01) :71-88
[6]
Etching materials with an atmospheric-pressure plasma jet [J].
Jeong, JY ;
Babayan, SE ;
Tu, VJ ;
Park, J ;
Henins, I ;
Hicks, RF ;
Selwyn, GS .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (03) :282-285
[7]
Dry etching characteristics of Si-based materials using CF4/O2 atmospheric-pressure glow discharge plasma [J].
Kataoka, Y ;
Kanoh, M ;
Makino, N ;
Suzuki, K ;
Saitoh, S ;
Miyajima, H ;
Mori, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (01) :294-298
[8]
Klomp AJA, 2000, J APPL POLYM SCI, V75, P480, DOI 10.1002/(SICI)1097-4628(20000124)75:4<480::AID-APP3>3.0.CO
[9]
2-9
[10]
A novel low temperature plasma generator with alumina coated electrode for open air material processing [J].
Koide, M ;
Horiuchi, T ;
Inushima, T ;
Lee, BJ ;
Tobayama, M ;
Koinuma, H .
THIN SOLID FILMS, 1998, 316 (1-2) :65-67