Optical depolarization induced by arrays of subwavelength metal holes

被引：19

作者：

Genet, C

Altewischer, E

van Exter, MP

Woerdman, JP

机构：

[1] Univ Strasbourg 1, ISIS, Nanostruct Lab, F-67083 Strasbourg, France

[2] Leiden Univ, Huygens Lab, NL-2300 RA Leiden, Netherlands

来源：

PHYSICAL REVIEW B | 2005年 / 71卷 / 03期

关键词：

D O I：

10.1103/PhysRevB.71.033409

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present a symmetry-based theory of the depolarization induced by subwavelength metal hole arrays. We derive the Mueller matrices of hole arrays with various symmetries (in particular square and hexagonal) when illuminated by a finite-diameter (e.g., Gaussian) beam. The depolarization is due to a combination of two factors: (i) polarization-dependent propagation of surface plasmons along the surface of the array and (ii) a spread of wave vectors in the incident beam.

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页数：4

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