Quantum paraelectric La1/2Na1/2TiO3 films as capacitor dielectrics for temperature- and electric-field-insensitive applications

被引：13

作者：

Rao, RMV ^{[1
]}

Munekata, H

Shimada, K

Lippmaa, M

Kawasaki, M

Inaguma, Y

Itoh, M

Koinuma, H

机构：

[1] Tokyo Inst Technol, Imaging Sci & Engn Lab, Yokohama, Kanagawa 2268502, Japan

[2] Tokyo Inst Technol, Dept Innovat & Engn Mat, Yokohama, Kanagawa 2268502, Japan

[3] Tokyo Inst Technol, Mat & Struct Lab, Yokohama, Kanagawa 2268503, Japan

来源：

JOURNAL OF APPLIED PHYSICS | 2000年 / 88卷 / 06期

关键词：

D O I：

10.1063/1.1288776

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thin films of La1/2Na1/2TiO3 fabricated by pulsed laser deposition show interesting dielectric properties exhibiting quantum paraelectric-type temperature-insensitive dielectric constant below 50 K. The dielectric constant (epsilon(r)similar to 180) is also very stable under electric bias up to 4x10(4) V/cm. These properties indicate that these films coupled with high temperature superconductors have a great potential for microwave applications. (C) 2000 American Institute of Physics. [S0021-8979(00)07618-0].

引用

页码：3756 / 3758

页数：3

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