Generic scanned-probe microscope sensors by combined micromachining and electron-beam lithography

We present a novel method for the fabrication of generic scanned-probe microscope probes by performing multiple level direct-write electron-beam lithography on the apex of micromachined atomic force microscope tips. Pattern transfer is by conventional etching or liftoff in a wide range of materials. Lithographic resolution is 50 nm or better. The substrates support the use of automatic alignment and allow for the fabrication of 50 probes/in(2). The integration of a force-sensing cantilever permits simple height regulation of the probes during operation. The technology is illustrated by the fabrication of thermocouple and near-field optical probes. (C) 1998 American Vacuum Society.