共 32 条
[1]
BASSETT NL, 1994, 9619105 UMI U HOUST
[5]
DENHARTOG E, 1991, P 10 INT S PLASM CHE, V2, P1
[7]
Characterization of Cl2/Ar high density plasmas for semiconductor etching
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1999, 17 (01)
:38-51
[8]
HERSHKOWITZ N, 1998, COMMUNICATION