Fabrication of low loss, waveguide grating filters using electron beam lithography

被引：3

作者：

Millar, P ^{[1
]}

Harkins, R ^{[1
]}

Aitchison, JS ^{[1
]}

机构：

[1] Univ Glasgow, Dept Elect & Elect Engn, Glasgow G12 8QQ, Lanark, Scotland

来源：

ELECTRONICS LETTERS | 1997年 / 33卷 / 12期

关键词：

waveguides; grating filters;

D O I：

10.1049/el:19970712

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A single step, electron beam writing process for the fabrication of low loss grating filters on AlGaAs rib waveguides is described. The technique allows both waveguide and grating to be defined in a single processing step. Linear loss measurements are presented which show that the presence of the grating has no significant effect on the throughput of the waveguides.

引用

页码：1031 / 1032

页数：2

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