Studies of the evolution of the topography of selected materials as a function of etching in reactive and non-reactive RF plasmas

被引：4

作者：

Anderson, CA ^{[1
]}

Brown, NMD ^{[1
]}

Cui, NY ^{[1
]}

Liu, ZH ^{[1
]}

McKinley, A ^{[1
]}

Walker, CGH ^{[1
]}

机构：

[1] Univ Ulster, Surface Sci Lab, Coleraine BT52 1SA, Londonderry, North Ireland

来源：

SURFACE & COATINGS TECHNOLOGY | 1997年 / 97卷 / 1-3期

关键词：

plasma etching; topography of materials; STM/AFM;

D O I：

10.1016/S0257-8972(97)00142-4

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Examples of the evolution of the topography of selected materials (synthetic graphite, molybdenum disulphide and muscovite mica) as a function of reactive (in oxygen) and nonreactive (in argon) etching in a 13.56 MHz plasma are considered. The dependence of the observed topography and its regular and semi-regular characteristic details on the power levels, gas pressures and treatment times is demonstrated, particularly at sub-micron scales. The topographical images, derived roughness and other data (obtained variously using scanning tunnelling microscopy and atomic force microscopy) are discussed with respect to the layer lattice structure of the materials processed. (C) 1997 Elsevier Science S.A.

引用

页码：151 / 157

页数：7

共 4 条

[1] AN INVESTIGATION USING ATOMIC-FORCE MICROSCOPY AND X-RAY PHOTOELECTRON-SPECTROSCOPY OF THE MODIFICATION OF THE SURFACE OF MICA WITH AN ARGON RF-PLASMA DISCHARGE [J].

BROWN, NMD ;

LIU, ZH .

APPLIED SURFACE SCIENCE, 1995, 90 (02) :155-164

[2]

BROWN NMD, UNPUB NAIYI CUI

[3]

YOU HX, 1992, SURF SCI, V279, P189, DOI 10.1016/0039-6028(92)90755-U

[4] RADIOFREQUENCY (RF) PLASMA-ETCHING OF GRAPHITE WITH OXYGEN - A SCANNING TUNNELING MICROSCOPE STUDY [J].

YOU, HX ;

BROWN, NMD ;

ALASSADI, KF .

SURFACE SCIENCE, 1993, 284 (03) :263-272

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