Light and oxygen protective properties of materials induced by surfactant molecular complex formation

被引：3

作者：

Ichikawa, H ^{[1
]}

Iimura, N ^{[1
]}

Wakabayashi, H ^{[1
]}

Hirata, H ^{[1
]}

机构：

[1] Niigata Coll Pharm, Niigata 9502081, Japan

来源：

JOURNAL OF COLLOID AND INTERFACE SCIENCE | 2000年 / 228卷 / 01期

关键词：

crystalline surfactant molecular complexes (SMCs); UV light resistivity to complex additives induced by SMC formation; oxygen resistivity to complex additives induced by SMC formation; development of drug protection from UV light; development of drug protection from oxygen;

D O I：

10.1006/jcis.2000.6906

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Crystalline surfactant molecular complexes, the quite stable existence of which we firmly established through X-ray structural analysis, etc., were examined with respect to the protection from UV light and oxygen provided to their additive components. Structural analysis has revealed that the complex additives are stably occluded in the mother surfactant crystal matrix. Through the examination it was confirmed that additive components in a cationic complex crystal structure were perfectly protected from both UV light and oxygen. On the other hand, in anionics the additives were perfectly safe from UV attack, but from oxygen the change was rather accelerated in comparison with the effect of that on the pure condition. (C) 2000 Aacademic Press.

引用

页码：32 / 39

页数：8

共 27 条

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