The effect of electromagnetic field exposure on the formation of DNA lesions

被引:17
作者
da Silva, RL
Albano, F
dos Santos, LRL
Tavares, AD
Felzenszwalb, I
机构
[1] Univ Estado Rio de Janeiro, Inst Biol Roberto Alcantara Gomes, Dept Biofis & Biometria, BR-20551030 Rio De Janeiro, Brazil
[2] Univ Estado Rio de Janeiro, Inst Fis, Dept Eletron Quant, BR-20551030 Rio De Janeiro, Brazil
关键词
D O I
10.1179/135100000101535843
中图分类号
Q5 [生物化学]; Q7 [分子生物学];
学科分类号
071010 ; 081704 ;
摘要
In an attempt to determine whether electromagnetic field (EMF) exposure might lead to DNA damage, we exposed SnCl2-treated pBR322 plasmids to EMF and analysed the resulting conformational changes using agarose gel electrophoresis. An EMF-dependent potentiation of DNA scission (i.e. the appearance of relaxed plasmids) was observed. In confirmation of this, plasmids pre-exposed to EMF also were less capable of transforming Escherichia coli. The results indicate that EMF, in the presence of a transition metal, is capable of causing DNA damage. These observations support the idea that EMF, probably through secondary generation of reactive oxygen species, can be clastogenic and provide a possible explanation for the observed correlation between EMF exposure and the frequency of certain types of cancers in humans.
引用
收藏
页码:299 / 301
页数:3
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