Polishing-related optical anisotropy of semi-insulating GaAs studied by reflectance difference spectroscopy

被引:6
作者
Chen, YH
Wang, ZG
Qian, JJ
Yang, Z
机构
[1] Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
[2] Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R China
关键词
D O I
10.1063/1.373874
中图分类号
O59 [应用物理学];
学科分类号
摘要
The strong in-plane optical anisotropy of (001) semi-insulating GaAs, which comes from the submicron region under the surface, has been observed by reflectance difference spectroscopy. The optical anisotropy can be explained by the anisotropic strain that is introduced by the asymmetric distribution of 60 degrees dislocations during surface polishing. The simulated spectra reproduce the line shape of the experimental ones. The simulations show that the anisotropic strain is typically about 2.3x10(-4). (C) 2000 American Institute of Physics. [S0021-8979(00)01315-3].
引用
收藏
页码:1695 / 1697
页数:3
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