Kinetic of the NO removal by nonthermal plasma in N2/NO/C2H4 mixtures

被引：52

作者：

Fresnet, F ^{[1
]}

Baravian, G ^{[1
]}

Magne, L ^{[1
]}

Pasquiers, S ^{[1
]}

Postel, C ^{[1
]}

Puech, V ^{[1
]}

Rousseau, A ^{[1
]}

机构：

[1] Univ Paris 11, Phys Gaz & Plasmas Lab, CNRS, UMR8578, F-91405 Orsay, France

来源：

APPLIED PHYSICS LETTERS | 2000年 / 77卷 / 25期

关键词：

D O I：

10.1063/1.1332413

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

NO removal is studied in N-2/NO and in N-2/NO/C2H4 mixtures through time-resolved laser-induced fluorescence in the afterglow of a pulsed homogeneous discharge. NO density measurements are compared with predictions of a 0D model on a large range of parameter values, such as the specific deposited energy and the ethene initial concentration. It is shown that dissociation of NO through collision with the N-2(a('1)Sigma (-)(u)) state play the main part in the NO removal kinetic. Moreover, quenching of N-2(a('1) Sigma (-)(u)) by C2H4 leads to a drastic decrease of the NO removal efficiency when ethene is added to N-2/NO. The determined rate coefficient value for the quenching mechanism is (4 +/-2)x10(-10) cm(3) s(-1). (C) 2000 American Institute of Physics. [S0003- 6951(00)01351-6].

引用

页码：4118 / 4120

页数：3

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