Hyperthermal molecular beam deposition of highly ordered organic thin films

被引:129
作者
Casalis, L [1 ]
Danisman, MF
Nickel, B
Bracco, G
Toccoli, T
Iannotta, S
Scoles, G
机构
[1] Princeton Univ, Dept Chem, Princeton, NJ 08544 USA
[2] Sincrotrone Trieste, I-34012 Trieste, Italy
[3] Univ Genoa, INFM, I-16146 Genoa, Italy
[4] Univ Genoa, Dept Phys, I-16146 Genoa, Italy
[5] Inst Photon & Nanotechnol, CNR, IFN, I-38050 Povo, Italy
关键词
D O I
10.1103/PhysRevLett.90.206101
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We use a seeded supersonic molecular beam to control the kinetic energy of pentacene (C22H14) during deposition and growth on Ag(111). Highly ordered thin films are grown at low substrate temperatures (similar to200 K) at kinetic energies of a few electron volts, as shown by low energy He diffraction and x-ray reflectivity spectra. In contrast, deposition of thermal molecules yields only amorphous films. Growth at room or higher temperature substrates yields films of poorer quality irrespective of the depositing beam energy. We find that after the first wetting layer is completed, a new ordered phase is formed, whose in-plane lattice spacings match one of the bulk crystal planes. The high quality of the films can be interpreted as the result of local annealing induced by the impact of the impinging high-energy molecules.
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页数:4
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