Micro-technology for anti-counterfeiting

被引：45

作者：

Lee, RA ^{[1
]}

机构：

[1] CSIRO Mfg Sci & Technol, Clayton, Vic, Australia

来源：

MICROELECTRONIC ENGINEERING | 2000年 / 53卷 / 1-4期

关键词：

Diffraction gratings - Holography - Light interference - Microelectromechanical devices - Optical resolving power;

D O I：

10.1016/S0167-9317(00)00367-1

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The use of electron beam lithography (EBL) techniques to produce novel diffractive optical microstructures for use as anti-counterfeiting devices is discussed. Specific results include optically variable portraiture, multi-channel effects and very high resolution micrographics.

引用

页码：513 / 516

页数：4