Kinetics of reactions in CH4/N2 afterglow plasma

被引:31
作者
Legrand, JC
Diamy, AM
Hrach, R [1 ]
Hrachova, V
机构
[1] Charles Univ, Fac Math & Phys, Dept Elect & Vacuum Phys, CR-18000 Prague 8, Czech Republic
[2] Univ Paris 06, CNRS, Lab Chim Gen & Chim Surfaces, URA 1428, F-75252 Paris, France
关键词
D O I
10.1016/S0042-207X(97)00066-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper chemical reactions initiated by the decomposition of methane in the nitrogen flowing afterglow are studied by computer modelling with the input data from microwave plasma. The model consists of 61 reactions between 24 kinds of species. The simulation technique is based on a macroscopic kinetic approach which provides the final concentrations of stable products-C2H6, C2H4, C2H2, HCN, H-2 together with CH4 and N-2. If was found that the stiffness of the set of equations describing the decomposition process can be monitored by the C and H mass balance. (C) 1997 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:671 / 675
页数:5
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