Thermal activation energies of Mg in GaN:Mg measured by the Hall effect and admittance spectroscopy

被引:47
作者
Kim, DJ [1 ]
Ryu, DY
Bojarczuk, NA
Karasinski, J
Guha, S
Lee, SH
Lee, JH
机构
[1] Chungnam Natl Univ, Dept Mat Engn, Taejon, South Korea
[2] IBM Corp, Div Res, Yorktown Hts, NY 10598 USA
[3] Kyungbuk Natl Univ, Dept Elect Engn, Taegu, South Korea
关键词
D O I
10.1063/1.1286925
中图分类号
O59 [应用物理学];
学科分类号
摘要
A series of GaN:Mg structures were grown in molecular beam epitaxy, using either one or two rf nitrogen sources, and in metalorganic chemical vapor deposition systems with varying Mg flux. Acceptor energies were measured using the Hall effect and admittance spectroscopy techniques. The acceptor energies were found to be different for the two methods, i.e., 135-155 meV for the Hall effect measurement and 80-115 meV for the admittance spectroscopy measurement. The apparently small acceptor energies from the admittance spectroscopy measurement were explained, through a simulation process, by the combined effects of (1) high Mg acceptor concentration with no other free carrier sources, and (2) the Mg emission kinetics assisted by the Frenkel-Poole field effect in the GaN:Mg structures. (C) 2000 American Institute of Physics. [S0021-8979(00)06616-0].
引用
收藏
页码:2564 / 2569
页数:6
相关论文
共 19 条
  • [1] Gotz W, 1996, APPL PHYS LETT, V68, P667, DOI 10.1063/1.116503
  • [2] Mg in GaN: Incorporation of a volatile species at high temperatures during molecular beam epitaxy
    Guha, S
    Bojarczuk, NA
    Cardone, F
    [J]. APPLIED PHYSICS LETTERS, 1997, 71 (12) : 1685 - 1687
  • [3] Ultraviolet and violet GaN light emitting diodes on silicon
    Guha, S
    Bojarczuk, NA
    [J]. APPLIED PHYSICS LETTERS, 1998, 72 (04) : 415 - 417
  • [4] HARKE JL, 1968, J APPL PHYS, V39, P4871
  • [5] Huang JW, 1996, APPL PHYS LETT, V68, P2392, DOI 10.1063/1.116144
  • [6] SCHOTTKY-BARRIER PHOTODETECTOR BASED ON MG-DOPED P-TYPE GAN FILMS
    KHAN, MA
    KUZNIA, JN
    OLSON, DT
    BLASINGAME, M
    BHATTARAI, AR
    [J]. APPLIED PHYSICS LETTERS, 1993, 63 (18) : 2455 - 2456
  • [7] KIM D, UNPUB
  • [8] Kim DJ, 1996, J KOREAN PHYS SOC, V29, P645
  • [9] LOW-TEMPERATURE C-V CHARACTERISTICS OF SI-DOPED AL0.3GA0.7AS AND NORMAL NORMAL-GAAS/N-AL0.3GA0.7AS ISOTYPE HETEROJUNCTIONS GROWN VIA MOLECULAR-BEAM EPITAXY
    KIM, DJ
    MADHUKAR, A
    [J]. JOURNAL OF APPLIED PHYSICS, 1991, 70 (11) : 6877 - 6882
  • [10] Mg-doped p-type GaN grown by reactive molecular beam epitaxy
    Kim, W
    Salvador, A
    Botchkarev, AE
    Aktas, O
    Mohammad, SN
    Morcoc, H
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (04) : 559 - 561