Selective dewetting for general purpose patterning

被引：55

作者：

Kim, YS ^{[1
]}

Lee, HH ^{[1
]}

机构：

[1] Seoul Natl Univ, Sch Chem Engn, Seoul 151744, South Korea

来源：

ADVANCED MATERIALS | 2003年 / 15卷 / 04期

关键词：

D O I：

10.1002/adma.200390082

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A simple method that allows patterning of a surface only on desired locations through selective dewetting is presented. In this technique, only selected locations of a polymer film on a substrate are made very thin with the aid of a template and heating. As such, a unique feature of the technique lies in the fact that the same template can be used to fabricate structures ranging in size from nanometer to micrometer.

引用

页码：332 / 334

页数：3

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