Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

被引：21

作者：

Canning, J ^{[1
]}

Åslund, M

Ankiewicz, A

Dainese, M

Fernando, H

Sahu, JK

Wosinski, L

机构：

[1] Univ Sydney, Australian Photon Cooperat Res Ctr, Opt Fibre Technol Ctr, Natl Innovat Ctr 101, Eveleigh, NSW 1430, Australia

[2] Australian Natl Univ, Australian Photon Cooperat Res Ctr, Ctr Opt Sci, Canberra, ACT, Australia

[3] Royal Inst Technol, Dept Elect, Lab Photon & Microwave Engn, S-16440 Kista, Sweden

来源：

APPLIED OPTICS | 2000年 / 39卷 / 24期

关键词：

D O I：

10.1364/AO.39.004296

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core. (C) 2000 Optical Society of America OCIS codes: 050.1950, 050.2770, 130.3130, 130.1750, 230.1950, 230.3120.

引用

页码：4296 / 4299

页数：4

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