Impedance of metal-gel derived film interface

被引:3
作者
Banerjee, S [1 ]
Chakravorty, D
机构
[1] Indian Assoc Cultivat Sci, Calcutta 700032, W Bengal, India
[2] Jawaharlal Nehru Ctr Adv Sci Res, Bangalore 560064, Karnataka, India
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 12A期
关键词
gel derived films; electrode-electrolyte interlace; constant-phase angle exponent;
D O I
10.1143/JJAP.36.7329
中图分类号
O59 [应用物理学];
学科分类号
摘要
Gel films of different compositions were grown on stainless steel and copper electrodes with varying degrees of roughness. The gel systems chosen were xM(2)O-(100-x)SiO2 (mole%) with M = Li, Na or K and x having values 10, 20 and 30 respectively. AC impedance of cells comprising the above with a counter electrode of the same type was measured over the frequency range 5 Hz to 1000 kHz. Constant Phase Angle (CPA) impedance characterizing the electrode-electrolyte interface shows a variation with frequency with the exponent n having values in the range 0.30 to 0.48. The fractal dimensions d of the electrode surfaces were determined from the self affine surface profile measurements. The ac impedance deduced n values are found to be in reasonable agreement with those calculated from the fractal dimensions of the electrode surfaces.
引用
收藏
页码:7329 / 7333
页数:5
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