Coarsening mechanisms in a metal film: From cluster diffusion to vacancy ripening

被引:180
作者
Wen, JM
Evans, JW
Bartelt, MC
Burnett, JW
Thiel, PA
机构
[1] IOWA STATE UNIV SCI & TECHNOL,DEPT MATH,AMES,IA 50011
[2] IOWA STATE UNIV SCI & TECHNOL,AMES LAB,AMES,IA 50011
关键词
D O I
10.1103/PhysRevLett.76.652
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Coarsening of Ag films on Ag(100) at room temperature occurs primarily via diffusion-mediated coalescence of two-dimensional adatom clusters, rather than by Ostwald ripening, up to a coverage of 0.65 monolayer. Above 0.8 monolayer, vacancy clusters coarsen primarily via Ostwald ripening, due to their much lower diffusivity. An asymmetric transition region separates these two regimes, characterized by a near-percolating structure which undergoes self-similar coarsening.
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页码:652 / 655
页数:4
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