Nanolithography with neutral chromium and helium atoms

被引：24

作者：

Brezger, B ^{[1
]}

Schulze, T ^{[1
]}

Drodofsky, U ^{[1
]}

Stuhler, J ^{[1
]}

Nowak, S ^{[1
]}

Pfau, T ^{[1
]}

Mlynek, J ^{[1
]}

机构：

[1] Univ Konstanz, Fak Phys, D-78457 Constance, Germany

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 06期

关键词：

D O I：

10.1116/1.589393

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We describe two experiments that use neutral atomic beam techniques to write nanostructures. In the chromium experiment, we have used neutral chromium atoms to write one-and two-dimensional periodic nanometer-scale structures in a direct way. The periodic structure is given to the atomic beam by a laser light mask. In a second experiment, we have used a self-assembling monolayer as a resist for metastable helium atoms in a proximity printing experiment. (C) 1997 American Vacuum Society.

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页码：2905 / 2911

页数：7

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