Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

被引：29

作者：

Rantala, JT ^{[1
]}

Nordman, N

Nordman, O

Vahakangas, J

Honkanen, S

Peyghambarian, N

机构：

[1] Univ Arizona, Ctr Opt Sci, Tucson, AZ 85721 USA

[2] VTT Elect, FIN-02044 VTT, Finland

来源：

ELECTRONICS LETTERS | 1998年 / 34卷 / 05期

关键词：

D O I：

10.1049/el:19980368

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.

引用

页码：455 / 456

页数：2

共 8 条

[1]

ANDREWS MP, 1997, SPIE CR, V68, P253

[2]

ITO T, 1993, IEICE T ELECTRON, VE76C, P588

[3] SOL-GEL INTEGRATED OPTICAL COUPLER BY ULTRAVIOLET-LIGHT IMPRINTING [J].