Glow discharge sputtering deposition of thin films of Ag, Cr, Cu, Ni, Pd, Rh and their binary alloys onto NaCl and MgO experimental parameters and epitaxy

被引：40

作者：

Reniers, F

Delplancke, MP

Asskali, A

Rooryck, V

VanSinay, O

机构：

[1] Université Libre de Bruxelles, Analytical Chemistry Department, Faculty of Sciences, Bruxelles, cp 255

来源：

APPLIED SURFACE SCIENCE | 1996年 / 92卷

关键词：

D O I：

10.1016/0169-4332(95)00198-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The experimental conditions to condense epitaxial films of Ag, Cr, Cu, Ni, Pd, Rh, AgPd, CuPd and CuRh on MgO(100) and NaCl(100) by glow discharge sputtering are reported. The films are characterized by THEED, RHEED, SAD, TEM, ICP and AES. The effect of the substrate, the temperature and the target composition on the films obtained is examined and discussed. perfect parallel epitaxy ((001)[110](d) parallel to(100)[110](s)) was observed for all systems studied, except for Ag/MgO.

引用

页码：35 / 42

页数：8

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