A spectroscopic study of DC magnetron and RF coil plasmas in ionised physical vapour deposition

被引：4

作者：

Christou, C ^{[1
]}

Chiu, KF ^{[1
]}

Barber, ZH ^{[1
]}

机构：

[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England

来源：

VACUUM | 2000年 / 58卷 / 2-3期

关键词：

magnetron sputtering; spectroscopy; ionisation;

D O I：

10.1016/S0042-207X(00)00175-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Emission spectroscopy in the visible and UV during ionised physical vapour deposition has been used to investigate the effects of a secondary inductive coil on magnetron sputter deposition of metal cathode targets. Atomic and ionic emission lines of the sputtering gas and sputtered metal were identified, and line intensity measurements were used to investigate the sputtering, excitation and ionisation of metal in the magnetron and RF plasmas. Ionisation of sputtered material by the magnetron plasma was found to be significant, and it was found that sputtering of material from the RF coil could be eliminated by the insertion of a capacitor in the external RF power circuit between the coil and earth. (C) 2000 Elsevier Science Ltd. All rights reserved.

引用

页码：250 / 255

页数：6

共 6 条

[1] ANGULAR-DISTRIBUTION OF PARTICLES SPUTTERED FROM CU, PT AND GE TARGETS BY KEV AR+ ION-BOMBARDMENT [J].

ANDERSEN, HH ;

STENUM, B ;

SORENSEN, T ;

WHITLOW, HJ .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 6 (03) :459-465

[2]

CHRISTOU C, 1999, P 24 ICPIG WARS POL, V1, P35

[3] Axially-resolved study of highly ionized physical vapor deposition [J].

Dickson, M ;

Hopwood, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (04) :2307-2312

[4] Ionized physical vapor deposition of integrated circuit interconnects [J].

Hopwood, J .

PHYSICS OF PLASMAS, 1998, 5 (05) :1624-1631

[5] MAGNETRON SPUTTER-DEPOSITION WITH HIGH-LEVELS OF METAL IONIZATION [J].

ROSSNAGEL, SM ;

HOPWOOD, J .

APPLIED PHYSICS LETTERS, 1993, 63 (24) :3285-3287

[6] FUNDAMENTAL CHARACTERISTICS OF BUILT-IN HIGH-FREQUENCY COIL-TYPE SPUTTERING APPARATUS [J].

YAMASHITA, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (02) :151-158

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