Atmospheric pressure chemical vapour deposition of WS2 thin films on glass

被引：74

作者：

Carmalt, CJ ^{[1
]}

Parkin, IP ^{[1
]}

Peters, ES ^{[1
]}

机构：

[1] UCL, Dept Chem, Christopher Ingold Labs, London WC1H 0AJ, England

来源：

POLYHEDRON | 2003年 / 22卷 / 11期

基金：

英国工程与自然科学研究理事会;

关键词：

metal sulfide; molecular precursor;

D O I：

10.1016/S0277-5387(03)00194-3

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

The atmospheric pressure chemical vapour deposition reaction Of W(CO)(6), WOCl(4) or WCl(6) with HS(CH(2))(2)SH or HSC(CH(3))(3) at 350-600degreesC leads to thin films Of WS(2) on glass substrates. The WS2 films were nanocrystalline, showed a W:S ratio of 1:2 by EDAX and gave Raman bands at 416 and 351 cm(-1). The films were silver or gold in colour, adhesive to the substrate and showed Volmer-Webber type growth by SEM. Optical band gaps were 1.4 eV. The films were reflective in the visible region and transparent in the near IR. (C) 2003 Elsevier Science Ltd. All rights reserved.

引用

页码：1499 / 1505

页数：7

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