Construction of microcolumn system and its application to nanolithography

被引：7

作者：

Lee, YJ

Kang, SH

Kim, DH

Park, JY

Choi, HJ

Kuk, Y

Chun, K

机构：

[1] Seoul Natl Univ, Interuniv Semicond Res Ctr, Gwanak Gu, Seoul 151742, South Korea

[2] Seoul Natl Univ, Sch Elect Engn, Gwanak Gu, Seoul 151742, South Korea

[3] Seoul Natl Univ, Dept Phys, Gwanak Gu, Seoul 151742, South Korea

来源：

MICROELECTRONIC ENGINEERING | 1998年 / 42卷

关键词：

D O I：

10.1016/S0167-9317(98)00113-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have constructed microcolumn sq stem that car. overcome the limitation of current e-beam lithography technology and tested them through experiments. Electron-optical lenses consist of multiple electrodes. Silicon electrodes have been fabricated bq micromachining technology and assembled with Pyres glass by anodic bonding. Electron-optical lens was equipped in UHV(Ultra High Vacuum) chamber. We have observed the emission characteristics of electrons from STM(Scanning Tunneling Microscope) tip and performed lithography with focused electrons. PMMA(poly-methylmethacrylate) was used for e-beam resist and 0.13 mu m isolated line was delineated on PMMA(poly-methylmethacrylate) with the microcolumn system.

引用

页码：485 / 488

页数：4