Use of the orthogonal projection approach (OPA) to monitor patch processes

被引：12

作者：

Gourvénec, S

Lamotte, C

Pestiaux, P

Massart, DL

机构：

[1] Free Univ Brussels, ChemoAC, Inst Pharmaceut, B-1090 Brussels, Belgium

[2] ATOFINA Res, B-7181 Feluy, Belgium

[3] TOTALFINAELF France, Ctr Rech Gonfreville, F-76700 Harfleur, France

来源：

APPLIED SPECTROSCOPY | 2003年 / 57卷 / 01期

关键词：

orthogonal projection approach; OPA; multivariate curve resolution; MCR; alternating least squares; ALS; batch; process control; on-line monitoring; near infrared; NIR;

D O I：

10.1366/000370203321165241

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The orthogonal projection approach (OPA) and multivariate curve resolution (MCR) are presented as a way to monitor batch processes using spectroscopic data. Curve resolution allows one to look within a batch and predict on-line real concentration profiles of the different species appearing during reactions. Taking into account the variations of the process by using an augmented matrix of complete batches, the procedure explained here calculates some prediction coefficients that can afterwards be applied for a new batch.

引用

页码：80 / 87

页数：8

共 25 条

[1] Evaluation of the orthogonal projection approach (OPA) and the SIMPLISMA approach on the Windig standard spectral data sets [J].