Novel low-cost approach for removal of surface contamination before texturization of commercial monocrystalline silicon solar cells

被引:41
作者
Gangopadhyay, U. [1 ]
Dhungel, S. K.
Mondal, A. K.
Saha, H.
Yi, J.
机构
[1] Jadavpur Univ, Dept Elect & Telecommun Engn, IC Design & Fabricat Ctr, Kolkata 700032, W Bengal, India
[2] Sungkyunkwan Univ, Sch Informat & Commun Engn, Suwon 440746, South Korea
[3] Bengal Engn & Sci Univ, Dept Chem, Sibpur 71103, Howrah, India
关键词
surface contamination; silicon surface; sodium hypochlorite; solar cell;
D O I
10.1016/j.solmat.2007.03.025
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
This paper reports a novel approach on the surface treatment of monocrystalline silicon solar cells using an inorganic chemical, sodium hypochlorite (NaOCl) that has some remarkable properties. The treatment of contaminated crystalline silicon wafer with hot NaOCl helps the removal of organic contaminants due to its oxidizing properties. The objective of this paper is to establish the effectiveness of this treatment using hot NaOCl solution before the saw damage removal step of the conventional NaOH texturing approach. A comparative study of surface morphology and FTIR analyses of textured monocrystalline silicon surfaces with and without NaOCl pre-treatment is also reported. The process could result in a significant low cost approach viable for cleaning silicon wafers on a mass production scale. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:1147 / 1151
页数:5
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