Chemical design and thin film preparation of p-type conductive transparent oxides

被引:146
作者
Yanagi, H [1 ]
Kawazoe, H [1 ]
Kudo, A [1 ]
Yasukawa, M [1 ]
Hosono, H [1 ]
机构
[1] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
p-type conductor; transparent oxide; delafossite;
D O I
10.1023/A:1009959920435
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Chemical design to find a new transparent conductive oxide having p-type conductivity has been proposed. Following the chemical design, we have selected CuGaO2 and CuAlO2 as candidate materials. CuGaO2 thin films were prepared on silica glass substrates by RF sputtering method. The optical band gap of the film was estimated to be similar to 3.4 eV. Positive sign of Seebeck coefficient demonstrated the p-type conductivity of the film. The dc conductivity of the film was 5.6 x 10(-3) S . cm(-1) and the activation energy was 0.22 eV at room temperature. Because of rough texture of the film, the observed conductivity was not an intrinsic property of the material. Further, CuAlO2 thin films were prepared by laser ablation. The film deposited in O-2 atmosphere of 1.3 Pa at 690 degrees C showed higher optical transmission in visible and near-infrared regions than previously reported. Contribution of Cu 3d components to upper edge of valence band in CuGaO2 and CuAlO2 were confirmed by photoemission spectroscopic measurements.
引用
收藏
页码:407 / 414
页数:8
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