Group delay ripple reduction and reflectivity increase in a chirped fiber Bragg crating by multiple-overwriting of a phase mask with an electron-beam

The phase errors in electron-beam-written step-chirped masks can be reduced by using a method based on the continuous movement approach and overwriting a pattern at the same place on the substrate several times. The group delay ripple of chirped fiber Bragg gratings fabricated by a Four-times-overwritten phase mask is comparable with that of gratings obtained using a holographically written chirped phase mask.