UV writing of channel waveguides in erbium doped fluoride glass thin films

被引：5

作者：

Boulard, B

Brilland, L

Poignant, H

机构：

[1] Fac Sci, Lab Fluorures, UPRES A6010, F-72085 Le Mans 9, France

[2] France Telecom, CNET Lannion, DTD TSO, Technopole Anticipa, F-22307 Lannion, France

来源：

ELECTRONICS LETTERS | 1998年 / 34卷 / 03期

关键词：

D O I：

10.1049/el:19981464

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The UV writing of channel waveguides in fluoride glass thin films grown by physical vapour deposition is reported. Near field inspection results at 0.63 mu m are shown.

引用

页码：267 / 268

页数：2

共 8 条

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