DII revisited in an modern guise -: 6H- and 4H-SiC

被引:33
作者
Sridhara, SG [1 ]
Nizhner, DG
Devaty, RP
Choyke, WJ
Dalibor, T
Pensl, G
Kimoto, T
机构
[1] Univ Pittsburgh, Dept Phys & Astron, Pittsburgh, PA 15260 USA
[2] Univ Erlangen Nurnberg, Inst Angew Phys, D-91058 Erlangen, Germany
[3] Kyoto Univ, Dept Elect Sci & Engn, Kyoto 60601, Japan
来源
SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2 | 1998年 / 264-2卷
关键词
photoluminescence; defects; ion implantation;
D O I
10.4028/www.scientific.net/MSF.264-268.493
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A persistent intrinsic defect spectrum is observed in the luminescence spectra of 6H and 4H SiC epilayers which were ion-implanted with ten different ions and subsequently annealed. We argue that the defect spectra observed in the two polytypes are in fact due to the D-II defect center, previously reported in 3C and 15R SiC.
引用
收藏
页码:493 / 496
页数:4
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