Electron temperature and radiative attachment continua in enclosed inductively coupled plasma in argon and chlorine

被引：5

作者：

Bol'shakov, AA ^{[1
]}

Barnes, RM ^{[1
]}

机构：

[1] Univ Massachusetts, Dept Chem, Lederle Grad Res Ctr, Amherst, MA 01003 USA

来源：

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY | 1997年 / 52卷 / 14期

关键词：

enclosed inductively coupled plasma; analysis of gases; plasma diagnostics;

D O I：

10.1016/S0584-8547(97)00100-6

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

Inductively coupled plasma (ICP) discharges in chlorine, argon, and their mixtures sustained inside a spherical quartz container at atmospheric pressure have been investigated. Continua of radiative attachment of a free electron to a chlorine atom in ICP are elucidated and are utilized to derive a spatial profile of electron temperature. A qualitative picture of elementary processes in enclosed ICP is given. Differences between electron and gas temperatures are discussed. Electron temperature is maximum in a periphery layer near the induction coil that is chosen for impurity determination. Concentrations of carbon and metal impurities are estimated. (C) 1997 Elsevier Science B.V.

引用

页码：2127 / 2150

页数：24

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