Sterilization of dental bacteria in a flowing N2-O2 postdischarge reactor

被引:8
作者
Monna, V [1 ]
Nguyen, C
Kahil, M
Ricard, A
Sixou, M
机构
[1] Univ Toulouse 3, CPAT, F-31062 Toulouse, France
[2] Univ Toulouse 3, Fac Chirurg Dent, F-31062 Toulouse, France
关键词
atomic oxygen; E; coli; dental bacteria; postdischarge; UV emission;
D O I
10.1109/TPS.2002.804198
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Destruction processes of several dental bacteria have been analyzed in a flowing postdischarge reactor. An N-2-5%O-2 gas mixture has been chosen to produce a high quantity of oxygen atoms and a UV emission intensity of NObeta bands in the whole reactor chamber. The first results obtained with Streptococcus mutans (Sm), Porphyromonas gingivalis (Pg), Fusobacterium nucleatum (Fn), Prevotella intermedia (Pi), and Escherichia coli (E. Coli) dental bacteria at initial concentrations from 10(6)-10(10) colony forming unit per milliliter (CFU/ml) introduced in small cylindrical Al substrates (previously sterilized) are reported. A full destruction of Sm, Pg, and Pi bacteria was obtained after 15-20 min and of Fn after 30 min of treatment. However, the E. coli bacteria, introduced to 10(10) CFU/ml was still not destroyed after a treatment time of 30 min.
引用
收藏
页码:1437 / 1439
页数:3
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