Development of super-hydrophilicity on nitrogen-doped TiO2 thin film surface by photoelectrochemical method under visible light

被引：117

作者：

Premkumar, J ^{[1
]}

机构：

[1] Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 1538904, Japan

来源：

CHEMISTRY OF MATERIALS | 2004年 / 16卷 / 21期

关键词：

D O I：

10.1021/cm049055g

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Flatband potential of nitrogen-doped TiO2 thin film was a little more positive (0.15 V, anodic shift) than that of TiO2 thin film, due to an increase in oxygen vacancy accompanied by nitrogen doping.

引用

页码：3980 / +

页数：3

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