Deposition of epitaxial Ti2AlC thin films by pulsed cathodic arc

被引：69

作者：

Rosen, J. ^{[1
]}

Ryves, L. ^{[1
]}

Persson, P. O. A. ^{[1
]}

Bilek, M. M. M. ^{[1
]}

机构：

[1] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia

来源：

JOURNAL OF APPLIED PHYSICS | 2007年 / 101卷 / 05期

基金：

澳大利亚研究理事会;

关键词：

D O I：

10.1063/1.2709571

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A multicathode high current pulsed cathodic arc has been used to deposit Ti2AlC thin films belonging to the group of nanolaminate ternary compounds of composition M(n+1)AX(n). The required stoichiometry was achieved by means of alternating plasma pulses from three independent cathodes. We present x-ray diffraction and transmission electron microscopy analysis showing that epitaxial single phase growth of Ti2AlC has been achieved at a substrate temperature of 900 degrees C. Our results demonstrate a powerful method for MAX phase synthesis, allowing for phase tuning within the M(n+1)AX(n) system. (c) 2007 American Institute of Physics.

引用

页数：2

共 13 条

[1] Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field [J].

Anders, A ;

Yushkov, GY .

JOURNAL OF APPLIED PHYSICS, 2002, 91 (08) :4824-4832

[2] The MN+1AXN phases:: A new class of solids;: Thermodynamically stable nanolaminates [J].

Barsoum, MW .

PROGRESS IN SOLID STATE CHEMISTRY, 2000, 28 (1-4) :201-281

[3]

Barsoum MW, 2001, AM SCI, V89, P334, DOI 10.1511/2001.4.334

[4] Optimizing the triggering mode for stable operation of a pulsed cathodic arc deposition system [J].

Gan, BK ;

Bilek, MMM ;

McKenzie, DR ;

Swift, PD ;

McCredie, G .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 2003, 12 (04) :508-512

[5] Growth and characterization of MAX-phase thin films [J].

Högberg, H ;

Hultman, L ;

Emmerlich, J ;

Joelsson, T ;

Eklund, P ;

Molina-Aldareguia, JM ;

Palmquist, JP ;

Wilhelmsson, O ;

Jansson, U .

SURFACE & COATINGS TECHNOLOGY, 2005, 193 (1-3) :6-10

[6]

Nowotny V.H., 1971, Prog. Solid State Chem, V5, P27, DOI [10.1016/0079-6786(71)90016-1, DOI 10.1016/0079-6786(71)90016-1, 10.1016/0079-6786, DOI 10.1016/0079-6786]

[7] A high-current pulsed cathodic vacuum arc plasma source [J].

Oates, TWH ;

Pigott, J ;

Mckenzie, DR ;

Bilek, MMM .

REVIEW OF SCIENTIFIC INSTRUMENTS, 2003, 74 (11) :4750-4754

[8] Mn+1AXn phases in the Ti-Si-C system studied by thin-film synthesis and ab initio calculations -: art. no. 165401 [J].

Palmquist, JP ;

Li, S ;

Persson, POÅ ;

Emmerlich, J ;

Wilhelmsson, O ;

Högberg, H ;

Katsnelson, MI ;

Johansson, B ;

Ahuja, R ;

Eriksson, O ;

Hultman, L ;

Jansson, U .

PHYSICAL REVIEW B, 2004, 70 (16) :1-13

[9] Towards large area MAX phase coatings on steel [J].

Walter, C ;

Martinez, C ;

El-Raghy, T ;

Schneider, JM .

STEEL RESEARCH INTERNATIONAL, 2005, 76 (2-3) :225-228

[10] Oxidation behavior of Ti3AlC2 at 1000-1400°C in air [J].

Wang, XH ;

Zhou, YC .

CORROSION SCIENCE, 2003, 45 (05) :891-907

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