Deposition of composite titania/vanadia thin films by chemical bath deposition

被引：21

作者：

Hoffmann, RC

Jeurgens, LPH

Wildhack, S

Bill, J

Aldinger, F

机构：

[1] Univ Stuttgart, Max Planck Inst Met Forsch, Pulvermet Lab, D-70569 Stuttgart, Germany

[2] Univ Stuttgart, Inst Nichtmet Anorgan Mat, Pulvermet Lab, D-70569 Stuttgart, Germany

[3] Max Planck Inst Met Res, Dept Mittemeijer, Stuttgart, Germany

来源：

CHEMISTRY OF MATERIALS | 2004年 / 16卷 / 22期

关键词：

D O I：

10.1021/cm040178a

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Composite titania/vanadia thin films were prepared on sulfonate-terminated self-assembled monolayers and surface-oxidized silicon substrates by chemical bath deposition. Films consist of homogeneously distributed titania and vanadia nanoparticles. No concentration gradient of these components was observed.

引用

页码：4199 / 4201

页数：3

共 22 条

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