A study on pulse plating amorphous Ni-Mo alloy coating used as HER cathode in alkaline medium

被引：128

作者：

Han, Qing ^{[1
,2
]}

Cui, Shuang ^{[3
]}

Pu, Nianwen ^{[4
]}

Chen, Jianshe ^{[1
,2
]}

Liu, Kuiren ^{[1
,2
]}

Wei, Xujun ^{[2
]}

机构：

[1] Northeastern Univ, Minist Educ, Key Lab Ecol Met Multimetall Mineral, Shenyang 110004, Peoples R China

[2] Northeastern Univ, Sch Met & Mat, Shenyang 110004, Peoples R China

[3] Liaoning Shihua Univ, Coll Environm & Biol Engn, Fushun 113001, Peoples R China

[4] Sichuan Chuan Wei Grp Co Ltd, Chengdu 610100, Peoples R China

来源：

INTERNATIONAL JOURNAL OF HYDROGEN ENERGY | 2010年 / 35卷 / 11期

基金：

中国国家自然科学基金;

关键词：

Pulse plating; Ni-Mo alloy; Amorphous coating; HER (hydrogen evolution reaction); HYDROGEN EVOLUTION REACTION; ELECTRODEPOSITION; MOLYBDENUM;

D O I：

10.1016/j.ijhydene.2010.03.093

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The amorphous Ni-Mo film with high HER (hydrogen evolution reaction) activity was obtained by pulse plating. The optimum electrodeposition conditions with respect to HER overpotential were determined, e.g. Na2MoO4 center dot 2H(2)O concentration, current density and duty cycle. Correspondingly, the compositions and components of the Ni-Mo coatings with various molybdenum contents were investigated systematically. The results showed that when the ratio of nickel and molybdenum concentrations in the electrodeposition bath is lower than 1 (mol%), the molybdenum content in the coating decreases with the increasing Na2MoO4 center dot 2H(2)O concentration, while the corresponding HER overpotential of the Ni-Mo film increases. The amorphous Ni-Mo coating was obtained when the molybdenum content was c.a. 30 mass%, which shows high HER activity (eta(200) = 62 mV at 200 mA cm(-2) and 80 degrees C) and excellent corrosion resistance. After galvano-static electrolysis for 100 h in 33 mass% NaOH solution, the amorphous structure was destroyed due to the dissolution of molybdenum. (C) 2010 Professor T. Nejat Veziroglu. Published by Elsevier Ltd. All rights reserved.

引用

页码：5194 / 5201

页数：8

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