Properties of NiO thin films deposited by intermittent spray pyrolysis process

被引:103
作者
Reguig, B. A. [1 ]
Khelil, A. [1 ]
Cattin, L. [1 ]
Morsli, M. [1 ]
Bernede, J. C. [1 ]
机构
[1] Univ Nantes, Nantes Atlantique Univ, LAMP, Fac Sci & Tech, F-44000 Nantes, France
关键词
p-type transparent semiconductor; NiO thin films; spray pyrolysis;
D O I
10.1016/j.apsusc.2006.09.046
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
NiO thin films have been grown on glass substrates by intermittent spray pyrolysis deposition of NiCl(2)(.)6H(2)O diluted in distilled water, using a simple "perfume atomizer". The effect of the solution molarity on their properties was studied and compared to those of NiO thin films deposited with a classical spray system. It is shown that NiO thin films crystallized in the NiO structure are achieved after deposition. Whatever the precursor molarity, the grain size is around 25-30 nm. The crystallites are preferentially oriented along the (1 1 1) direction. All the films are p-type. However, the thickness and the conductivity of the NiO films depend on the precursor contraction. By comparison with the properties of films deposited by classical spray technique, it is shown that the critical precursor concentration, which induces strong thin films properties perturbations, is higher when a perfume atomizer is used. This broader stability domain can be attributed to better chlorides decomposition during the rest time used in the perfume atomizer technique. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:4330 / 4334
页数:5
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