Edge-pinned states in patterned submicron NiFeCo structures

被引:31
作者
Shi, J [1 ]
Tehrani, S
机构
[1] Univ Utah, Dept Phys, Salt Lake City, UT 84112 USA
[2] Motorola Labs, Phys Sci Res Labs, Tempe, AZ 85284 USA
关键词
D O I
10.1063/1.1290599
中图分类号
O59 [应用物理学];
学科分类号
摘要
Magnetization reversal in patterned submicron NiFeCo structures has been studied. Application of a transverse field lowers the easy axis switching threshold of the center of the structures but the edge magnetization remains pinned along the initial direction until a higher reversal field is applied. Complete switching between the two stable magnetization states occurs only after depinning and reversal of the edge magnetization. The edge depinning field is found to be very insensitive to the transverse field strength. Micromagnetic simulations are used to characterize the magnetization reversal process. (C) 2000 American Institute of Physics. [S0003-6951(00)01936-7].
引用
收藏
页码:1692 / 1694
页数:3
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