Positive domain wall resistance of 180° Neel walls in Co thin films -: art. no. 017204

被引:35
作者
Buntinx, D [1 ]
Brems, S [1 ]
Volodin, A [1 ]
Temst, K [1 ]
Van Haesendonck, C [1 ]
机构
[1] Katholieke Univ Leuven, Lab Vaste Stoffys & Magnetisme, B-3001 Louvain, Belgium
关键词
D O I
10.1103/PhysRevLett.94.017204
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We measured the intrinsic domain wall resistance (DWR) of 180degrees Neel walls in a polycrystalline Co thin film deposited on top of a patterned antiferromagnetic CoO template. After field cooling through the CoO blocking temperature, exchange bias induces a spatially modulated coercivity of the Co film, resulting in a periodic domain pattern with 180degrees Neel walls. The intrinsic DWR is determined unambiguously by using rotating magnetic fields that result in a reversible creation and annihilation of the Neel walls. In contrast with earlier reports, the DWR is positive and in agreement with models based on the giant magnetoresistance mechanism. A reliable, quantitative determination of the DWR requires careful numerical evaluation of the anisotropic magnetoresistance effect.
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页数:4
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