X-ray surface diffraction of metal deposits at metal/liquid interfaces - Part I: Copper deposit on Au(100)

被引:3
作者
Cappadonia, M [1 ]
Robinson, KM [1 ]
Schmidberger, J [1 ]
Stimming, U [1 ]
机构
[1] Forschungszentrum Julich, Inst Energieverfahrenstech, D-52452 Julich, Germany
关键词
D O I
10.1142/S0218625X97001498
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this work the Cu deposition on Au(100) in aqueous perchloric acid has been investigated by in situ X-ray surface diffraction (XRSD). The Cu deposition reaction on gold single crystals exhibits an underpotential deposition (UPD) whereby a fraction of a monolayer is formed. The XRSD measurements show that the Cu UPD layer has a primitive (1 x 1) structure and that the adsorbed Cu species sit in fourfold hollow sites with a vertical distance between the Cu adlayer and the gold surface of 1.4 Angstrom. The results are discussed in consideration of STM,(1) EXAFS(2) and XSW(3) experiments.
引用
收藏
页码:1173 / 1178
页数:6
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