Exchange coupling and GMR properties in ion beam sputtered hematite spin-valves

被引:13
作者
Sano, M [1 ]
Araki, S [1 ]
Ohta, M [1 ]
Noguchi, K [1 ]
Morita, H [1 ]
Matsuzaki, M [1 ]
机构
[1] TDK Corp, Data Storage Components Business Grp, Nagaizumi, Shizuoka 38902, Japan
关键词
D O I
10.1109/20.667766
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have succeeded in fabricating of hematite (alpha-Fe2O3) antiferromagnetic (AF) thin films by the ion beam sputtering method, which give unidirectional anisotoropy to the adjacent ferromagnetic layer. Its exchange bias energy (J(ex)) is 0.03 erg/cm(2), and blocking temperature (T-b) is 250 degrees C. Spin-valve films with the hematite AF layer were also fabricated. They exhibit GMR property with unidirectional anisotoropy of the pinned layer. Spin-valve films of which magnetic layers consist of only NiFe exhibit relatively low MR ratio and poor thermal stability. However, the spin-valve using Co as the pinned layer and the free layer at the Cu interface exhibits MR ratio of more than 6% and excellent thermal stability.
引用
收藏
页码:372 / 374
页数:3
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