SU8-silver photosensitive nanocomposite

被引：56

作者：

Jiguet, S ^{[1
]}

Bertsch, A

Hofmann, H

Renaud, P

机构：

[1] Swiss Fed Inst Technol, EPFL, STI, IMM,LMIS4, CH-1015 Lausanne, Switzerland

[2] Swiss Fed Inst Technol, EPFL, STI, IMX,LTP, CH-1015 Lausanne, Switzerland

来源：

ADVANCED ENGINEERING MATERIALS | 2004年 / 6卷 / 09期

关键词：

D O I：

10.1002/adem.200400068

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new conductive silver photosensitive composite material, allowing the direct manufacture of electrically conductive micro-components, was discussed. It was suggested that the reduction of the polymerized thickness of the SU8-silver composite resist is related to the absorption of light by the silver nanoparticles and to the high reflectance of the medium. The influence of the filler properties, such as volume fraction, and aspect ratio were found to have significant affects on the optical properties of the composite. The SU8-silver structures made by UV-LIGA in back side mode and with the integrated mask were observed to show a resolution better than 5 μm.

引用

页码：719 / 724

页数：6

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