Large area pulsed laser deposition of Aurivillius-type layered perovskite thin films

被引:6
作者
Pignolet, A
Curran, C
Welke, S
Senz, S
Alexe, M
Hesse, D
Gosele, U
机构
来源
FERROELECTRIC THIN FILMS V | 1996年 / 433卷
关键词
D O I
10.1557/PROC-433-125
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thin films of Aurivillius-type layered perovskites of Bi4Ti3O12 and SrBi2Ta2O9 have been epitaxially deposited by pulsed laser deposition (PLD) on SrTiO3 single crystal substrates. Bi4Ti3O12 has been deposited as well on a CeO2/YSZ/Si(100) buffer layer, and on Pt-coated oxidized silicon for electrical measurements. Using a new technique for large area PLD, Bi4Ti3O12 has also been deposited on a whole (100)-oriented 3 ''-Si wafer. The obtained films have a uniform thickness over a diameter greater than 50 mm, corresponding to an area of about 20 cm(2). It is likely that homogeneous deposition on entire wafers of 3-inch in diameter will be accomplished in the near future. The composition, structure, and electrical properties of the films are presented.
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页码:125 / 130
页数:6
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