Current-sensing scanning near-field optical microscopy using a metal probe for nanometre-scale observation of electrochromic films

被引:3
作者
Iwata, F
Mikage, K
Sakaguchi, H
Kitao, M
Sasaki, A
机构
[1] Shizuoka Univ, Fac Engn, Hamamatsu, Shizuoka 4328561, Japan
[2] Shizuoka Univ, Elect Res Inst, Hamamatsu, Shizuoka 4328011, Japan
关键词
atomic force microscopy; electrochromic film; laser; near-field optics; scanning near-field optical microscopy;
D O I
10.1046/j.1365-2818.2003.01127.x
中图分类号
TH742 [显微镜];
学科分类号
摘要
A novel technique for scanning near-field optical microscopy capable of point-contact current-sensing was developed in order to investigate the nanometre-scale optical and electrical properties of electrochromic materials. An apertureless bent-metal probe was fabricated in order to detect optical and current signals at a local point on the electrochromic films. The near-field optical properties could be observed using the local field enhancement effect generated at the edge of the metal probe under p -polarized laser illumination. With regard to electrical properties, current signal could be detected with the metal probe connected to a high-sensitive current amplifier. Using the current-sensing scanning near-field optical microscopy, the surface topography, optical and current images of coloured WO3 thin films were observed simultaneously. Furthermore, nanometre-scale electrochromic modification of local bleaching could be performed using the current-sensing scanning near-field optical microscopy. The current-sensing scanning near-field optical microscopy has potential use in various fields of nanometre-scale optoelectronics.
引用
收藏
页码:241 / 246
页数:6
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